Engineered DNA constructs as masks for nanopatterning
Purdue University scientists have demonstrated that DNA can be used to produce highly defined nanopatterns or nanoimprints on metal surfaces. This technology has a broad range of applications from the fabrication of nanoelectronic circuits to biological microarrays. The use of designable molecular structures improves photolithography (the process of transferring a pattern from a photomask to the surface of a substrate, such as metal or silicon) by obtaining control of the topography of nanoscaled patterns and by scaling-down their feature dimensions to nanoscale. This allows for bottom-up self assembly using DNA nanostructures in the fabrication of semiconductor devices.
This technology (OTC No. 64024) is available for licensing. Visit our available technologies page for more information.
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